Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions
Griesser, Thomas, Höfler, Thomas, Temmel, Susanne, Kern, Wolfgang, Trimmel, GregorVolume:
19
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm070506h
Date:
June, 2007
File:
PDF, 288 KB
english, 2007