Synchronous Pulse Plasma Operation upon Source and Bias...

Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

Tokashiki, Ken, Cho, Hong, Banna, Samer, Lee, Jeong-Yun, Shin, Kyoungsub, Todorow, Valentin, Kim, Woo-Seok, Bai, KeunHee, Joo, Sukho, Choe, Jeong-Dong, Ramaswamy, Kartik, Agarwal, Ankur, Rauf, Shahid,
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.48.08hd01
Date:
August, 2009
File:
PDF, 1.94 MB
english, 2009
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