Low inversion equivalent oxide thickness and enhanced mobility in MOSFETs with chlorine plasma interface engineering
Li, Chen-Chien, Chang-Liao, Kuei-Shu, Chen, Li-Ting, Fu, Chung-Hao, Hong, Hao-Zhi, Li, Mong-Chi, Chi, Wei-Fong, Lu, Chun-Chang, Ye, Zong-Hao, Wang, Tien-KoVolume:
101
Language:
english
Journal:
Solid-State Electronics
DOI:
10.1016/j.sse.2014.06.028
Date:
November, 2014
File:
PDF, 1.84 MB
english, 2014