Radical surface interactions in industrial silicon plasma...

Plasma Sources Science and Technology 2010 / 06 Vol. 19; Iss. 3

Radical surface interactions in industrial silicon plasma etch reactors

Cunge, G, Vempaire, D, Ramos, R, Touzeau, M, Joubert, O, Bodard, P, Sadeghi, N
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Volume:
19
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/19/3/034017
Date:
June, 2010
File:
PDF, 1.41 MB
english, 2010
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