Neutron Reflectivity Characterization of the Photoacid...

Neutron Reflectivity Characterization of the Photoacid Reaction-Diffusion Latent and Developed Images of Molecular Resists for Extreme Ultraviolet Lithography

Prabhu, Vivek M., Kang, Shuhui, Sha, Jing, Bonnesen, Peter V., Satija, Sushil, Wu, Wen-li, Ober, Christopher K.
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Volume:
28
Language:
english
Journal:
Langmuir
DOI:
10.1021/la301311m
Date:
May, 2012
File:
PDF, 2.51 MB
english, 2012
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