Low-Temperature Microwave Annealing Processes for Future IC...

IEEE Transactions on Electron Devices 2014 / 03 Vol. 61; Iss. 3

Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review

Lee, Yao-Jen, Cho, Ta-Chun, Chuang, Shang-Shiun, Hsueh, Fu-Kuo, Lu, Yu-Lun, Sung, Po-Jung, Chen, Hsiu-Chih, Current, Michael I., Tseng, Tseung-Yuen, Chao, Tien-Sheng, Hu, Chenming, Yang, Fu-Liang
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Volume:
61
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/ted.2014.2300898
Date:
March, 2014
File:
PDF, 7.31 MB
english, 2014
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