Hot-wall chemical vapor deposition of copper from copper(I) compounds. 2. Selective, low-temperature deposition of copper from copper(I) .beta.-diketonate compounds, (.beta.-diketonate)CuLn, via thermally induced disproportionation reactions
Shin, H. K., Chi, K. M., Hampden-Smith, M. J., Kodas, T. T., Farr, J. D., Paffett, M.Volume:
4
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/cm00022a009
Date:
July, 1992
File:
PDF, 2.25 MB
english, 1992