Annealing Effect on Low-Resistance Ferromagnetic Tunnel...

Japanese Journal of Applied Physics 2000 / 10 Vol. 39; Iss. Part 1, No

Annealing Effect on Low-Resistance Ferromagnetic Tunnel Junctions

Ando, Yasuo, Kubota, Hitoshi, Hayashi, Masamitsu, Kamijo, Makoto, Yaoita, Kazuya, Yu, Andrew Chak Chung, Han, Xiu-Feng, Miyazaki, Terunobu
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.39.5832
Date:
October, 2000
File:
PDF, 1.00 MB
english, 2000
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