Atomic Layer Deposition of HfO 2 Using Alkoxides as Precursors
Mui, Collin, Musgrave, Charles B.Volume:
108
Language:
english
Journal:
The Journal of Physical Chemistry B
DOI:
10.1021/jp037507r
Date:
September, 2004
File:
PDF, 1.03 MB
english, 2004