The Use of Combinatorial Chemical Vapor Deposition in the...

The Use of Combinatorial Chemical Vapor Deposition in the Synthesis of Ti 3-δ O 4 N with 0.06 < δ < 0.25:  A Titanium Oxynitride Phase Isostructural to Anosovite

Hyett, Geoffrey, Green, Mark A., Parkin, Ivan P.
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Volume:
129
Language:
english
Journal:
Journal of the American Chemical Society
DOI:
10.1021/ja073355s
Date:
December, 2007
File:
PDF, 356 KB
english, 2007
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