Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch...

Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch Si Technology

Cheong, Lin Lee, Paul, Philip, Holzner, Felix, Despont, Michel, Coady, Daniel J., Hedrick, James L., Allen, Robert, Knoll, Armin W., Duerig, Urs
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Volume:
13
Language:
english
Journal:
Nano Letters
DOI:
10.1021/nl4024066
Date:
September, 2013
File:
PDF, 1.83 MB
english, 2013
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