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Electrochemical aspects of copper chemical mechanical planarization (CMP) in peroxide based slurries containing BTA and glycine
Y. Ein-Eli, E. Abelev, D. StarosvetskyVolume:
49
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.electacta.2003.11.010
File:
PDF, 316 KB
english, 2004