Properties of SiO2 thin films prepared by anodic oxidation...

Electrochimica Acta 2004 Vol. 49; Iss. 25

Properties of SiO2 thin films prepared by anodic oxidation under UV illumination and rapid photothermal processing

S.T Shishiyanu, O.I Lupan, T.S Shishiyanu, V.P Şontea, S.K Railean
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Volume:
49
Year:
2004
Language:
english
Pages:
6
DOI:
10.1016/j.electacta.2004.04.034
File:
PDF, 133 KB
english, 2004
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