Low-Temperature Etching of Cu by Hydrogen-Based Plasmas

Low-Temperature Etching of Cu by Hydrogen-Based Plasmas

Wu, Fangyu, Levitin, Galit, Hess, Dennis W.
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Volume:
2
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am1003206
Date:
August, 2010
File:
PDF, 2.16 MB
english, 2010
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