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Low-Temperature Etching of Cu by Hydrogen-Based Plasmas
Wu, Fangyu, Levitin, Galit, Hess, Dennis W.Volume:
2
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am1003206
Date:
August, 2010
File:
PDF, 2.16 MB
english, 2010