The doping of silicon with boron by rapid thermal...

Semiconductor Science and Technology 1988 / 04 Vol. 3; Iss. 4

The doping of silicon with boron by rapid thermal processing

Souza, J P de, Hasenack, C M, Swart, J E
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Volume:
3
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/3/4/001
Date:
April, 1988
File:
PDF, 327 KB
english, 1988
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