High-throughput study of the anodic oxidation of Hf–Ti thin...

Electrochimica Acta 2009 Vol. 54; Iss. 22

High-throughput study of the anodic oxidation of Hf–Ti thin films

Andrei Ionut Mardare, Alfred Ludwig, Alan Savan, Andreas Dirk Wieck, Achim Walter Hassel
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
54
Year:
2009
Language:
english
Pages:
8
DOI:
10.1016/j.electacta.2009.01.016
File:
PDF, 2.45 MB
english, 2009
Conversion to is in progress
Conversion to is failed