[IEEE 2005 IEEE VLSI-TSA. International Symposium on VLSI Technology (VLSI-TSA-TECH) - Hsinchu, Taiwan (25-27 April 2005)] IEEE VLSI-TSA International Symposium on VLSI Technology, 2005. (VLSI-TSA-Tech). - Inversion MOS capacitance extraction for ultra-thin gate oxide using BSIM4
Wei Lee,, Ke-Wei Su,, Chung-Shi Chiang,, Liu, S., Pin Su,Year:
2005
Language:
english
DOI:
10.1109/VTSA.2005.1497081
File:
PDF, 351 KB
english, 2005