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[IEEE 2006 International Symposium on Semiconductor Manufacturing (ISSM) - Tokyo, Japan (2006.09.25-2006.09.27)] 2006 IEEE International Symposium on Semiconductor Manufacturing - Overall Wafer Effectiveness (OWE): A Novel Industry Standard for Wafer Productivity

Chien, Chen-Fu, Hsu, Chia-Yu, Chou, Hong-Shing, Lin, Chih-Wei
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Year:
2006
Language:
english
DOI:
10.1109/ISSM.2006.4493094
File:
PDF, 1.27 MB
english, 2006
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