[IEEE 2007 International Symposium on VLSI Technology,...

  • Main
  • [IEEE 2007 International Symposium on...

[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - The Effects of ONO thickness on Memory Characteristics in Nano-scale Charge Trapping Devices

Kim, Moon Kyung, Chae, SooDoo, Kim, Chung Woo, Kim, Jooyeon, Tiwari, S.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Year:
2007
Language:
english
DOI:
10.1109/VTSA.2007.378897
File:
PDF, 1.02 MB
english, 2007
Conversion to is in progress
Conversion to is failed