XPS and AFM investigation of hafnium dioxide thin films...

Journal of Electron Spectroscopy and Related Phenomena 2007 Vol. 156-158; Iss. none

XPS and AFM investigation of hafnium dioxide thin films prepared by atomic layer deposition on silicon

V. Sammelselg, R. Rammula, J. Aarik, A. Kikas, K. Kooser, T. Käämbre
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Volume:
156-158
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.elspec.2006.12.070
File:
PDF, 680 KB
english, 2007
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