[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Novel NiSi technology utilizing Ti/Ni/TiN structure and fluorine implantation for thermal stability improvement by suppression of abnormal oxidation
Jang-Gn Yun,, Soon-Young Oh,, Hee-Hwan Ji,, Bin-Feng Huang,, Young-Ho Park,, Jin-Suk Wang,, Hi-Deok Lee,Year:
2004
Language:
english
DOI:
10.1109/IWJT.2004.1306776
File:
PDF, 303 KB
english, 2004