[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - A pocket implant model for sub-0.18 micron CMOS process flows
Vasanth, K., Nandakumar, M., Rodder, M., Sridhar, S., Mozumder, P.K., Chen, I.-C.Year:
1997
Language:
english
DOI:
10.1109/SISPAD.1997.621367
File:
PDF, 233 KB
english, 1997