[IEEE 2007 IEEE Symposium on VLSI Technology - Kyoto, Japan (2007.06.12-2007.06.14)] 2007 IEEE Symposium on VLSI Technology - Beneath-The-Channel Strain-Transfer-Structure (STS) and Embedded Source/Drain Stressors for Strain and Performance Enhancement of Nanoscale MOSFETs
Ang, Kah-Wee, Lin, Jianqiang, Tung, Chih-Hang, Balasubramanian, N., Samudra, Ganesh, Yeo, Yee-ChiaYear:
2007
Language:
english
DOI:
10.1109/VLSIT.2007.4339719
File:
PDF, 989 KB
english, 2007