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[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - A computationally efficient ion implantation damage model and its application to multiple implant simulations
Tian, S., Wang, G., Morris, M., Morris, S., Obradovic, B., Tasch, A., Kennel, H., Packan, P., Magee, C., Sheng, J., Lowther, R., Linn, J., Snell, C.Year:
1997
Language:
english
DOI:
10.1109/SISPAD.1997.621399
File:
PDF, 461 KB
english, 1997