[IEEE Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Honolulu, HI, USA (2004.06.17-2004.06.17)] Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004. - Demonstration of fully Ni-silicided metal gates on HfO/sub 2/ based high-k gate dielectrics as a candidate for low power applications
Anil, K.G., Veloso, A., Kubicek, S., Schram, T., Augendre, E., de Marneffe, J.-F., Devriendt, K., Lauwers, A., Brus, S., Henson, K., Biesemans, S.Year:
2004
Language:
english
DOI:
10.1109/VLSIT.2004.1345472
File:
PDF, 168 KB
english, 2004