Characteristics of Ferroelectric Gate Transistor Using Nd...

Integrated Ferroelectrics 2004 / 01 Vol. 64; Iss. 1

Characteristics of Ferroelectric Gate Transistor Using Nd 2 Ti 2 O 7 /HfO 2 /Si Structures

KIM, WOO SIK, LEE, CHANG KI, YANG, JUN-KYU, PARK, HYUNG-HO
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Volume:
64
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580490894690
Date:
January, 2004
File:
PDF, 217 KB
english, 2004
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