[IEEE 1992 Symposium on VLSI Technology Digest of Technical Papers - Seattle, WA, USA (2-4 June 1992)] 1992 Symposium on VLSI Technology Digest of Technical Papers - Highly anisotropic microwave plasma etching for high packing density silicon patterns
Kure, T., Gotoh, Y., Kawakami, H., Tachi, S.Year:
1992
Language:
english
DOI:
10.1109/VLSIT.1992.200640
File:
PDF, 320 KB
english, 1992