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[IEEE 2008 IEEE Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2008.06.15-2008.06.16)] 2008 IEEE Silicon Nanoelectronics Workshop - Hole mobility enhancement by [110] uniaxial compressive strain in(110) oriented ultra-thin body pFETs with SOI thickness of less than 4 nm
Shimizu, Ken, Hiramoto, ToshiroYear:
2008
Language:
english
DOI:
10.1109/SNW.2008.5418446
File:
PDF, 1.41 MB
english, 2008