![](/img/cover-not-exists.png)
[IEEE Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Kyoto, Japan (June 14-16, 2005)] Digest of Technical Papers. 2005 Symposium on VLSI Technology, 2005. - Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications
Wen, H.C., Alshareef, H.N., Luan, H., Choi, K., Lysaght, P., Harris, H.R., Huffman, C., Brown, G.A., Bersuker, G., Zeitzoff, P., Huff, H., Majhi, P., Lee, B.H.Year:
2005
Language:
english
DOI:
10.1109/.2005.1469206
File:
PDF, 570 KB
english, 2005