[IEEE 2007 International Symposium on VLSI Technology,...

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[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Accurate Modeling and Characterization of Mobility in Tensile and Compressive Stress for State-of-the-Art Manufacturing NMOSFETS

Wang, J.-S., Chen, William P.N., Shih, C.-H., Lien, C., Su, Pin, Sheu, Y.-M., Chao, Donald Y.-S., Goto, K.
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Year:
2007
Language:
english
DOI:
10.1109/VTSA.2007.378964
File:
PDF, 2.10 MB
english, 2007
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