[IEEE Proceedings of 1995 IEEE International Reliability Physics Symposium - Las Vegas, NV (1995.04.4-1995.04.6)] 33rd IEEE International Reliability Physics Symposium - Effect of Al alloy and stacked film composition on linewidth dependence of electromigration lifetime
Atakov, E.M., Ling, J., Maziarz, J., Shepela, A., Miner, B., England, C., Harris, W., Dunnell, D.Year:
1995
Language:
english
DOI:
10.1109/relphy.1995.513701
File:
PDF, 1.54 MB
english, 1995