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The low temperature atomic layer deposition of ruthenium and the effect of oxygen exposure
Methaapanon, Rungthiwa, Geyer, Scott M., Lee, Han-Bo-Ram, Bent, Stacey F.Volume:
22
Year:
2012
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/c2jm35332f
File:
PDF, 673 KB
english, 2012