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Impact of strained-silicon-on-insulator (sSOI) substrate on FinFET mobility
Xiong, W., Cleavelin, C.R., Kohli, P., Huffman, C., Schulz, T., Schruefer, K., Gebara, G., Mathews, K., Patruno, P., Le Vaillant, Y.-M., Cayrefourcq, I., Kennard, M., Mazure, C., Shin, K., Liu, T.-J.KVolume:
27
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/led.2006.877714
Date:
July, 2006
File:
PDF, 295 KB
english, 2006