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[IEEE 2008 IEEE International Reliability Physics Symposium (IRPS) - Phoenix, AZ, USA (2008.04.27-2008.05.1)] 2008 IEEE International Reliability Physics Symposium - A new dielectric degradation phenomenon in nMOS high-k devices under positive bias stress
Dawei Heh,, Kirsch, Paul D., Young, Chadwin D., Bersuker, GennadiYear:
2008
Language:
english
DOI:
10.1109/relphy.2008.4558910
File:
PDF, 207 KB
english, 2008