[IEEE 2009 Spanish Conference on Electron Devices (CDE) - Santiago de Compostela, Spain (2009.02.11-2009.02.13)] 2009 Spanish Conference on Electron Devices - Interfacial Properties of HfO2/ SiN/Si Gate Structures
Toledano-Luque, M., del Prado, A., Feijoo, P. C., Amezaga, A., Andres, E. San, Lucia, M. L.Year:
2009
Language:
english
DOI:
10.1109/sced.2009.4800420
File:
PDF, 627 KB
english, 2009