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[IEEE 2002 Symposium on VLSI Technology Digest of Technical Papers - Honolulu, HI, USA (11-13 June 2002)] 2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303) - A highly manufacturable 110 nm DRAM technology with 8F/sup 2/ vertical transistor cell for 1Gb and beyond
Akatsu, H., Weis, R., Cheng, K., Seitz, M., Kim, M.-S., Ramachandran, R., Dyer, T., Kim, B., Kim, D.-K., Malik, R., Strane, J., Goebel, T., Kwon, O.-J., Sung, C.Y., Parkinson, P., Wilson, K., McStay,Year:
2002
Language:
english
DOI:
10.1109/vlsit.2002.1015384
File:
PDF, 254 KB
english, 2002