[IEEE 2012 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2012.04.23-2012.04.25)] Proceedings of Technical Program of 2012 VLSI Technology, System and Application - Optimization of control gate material and structure for enhancing 20nm 64Gb NAND flash reliability
Hae Soo Kim,, Kang Jae Lee,, Kwang Hee Han,, Seok Won Cho,, Se Kyoung Choi,, Shin Won Seo,, Jae Hyun Chung,, Keun Woo Lee,, Sung Jae Chung,, Keum Hwan Noh,, Tae Un Youn,, Ju Yeab Lee,, MinYear:
2012
Language:
english
DOI:
10.1109/vlsi-tsa.2012.6210120
File:
PDF, 359 KB
english, 2012