[IEEE 2008 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2008) - Hakone-Machi, Kanagawa (2008.09.9-2008.09.11)] 2008 International Conference on Simulation of Semiconductor Processes and Devices - Atomistic approach for Boron Transient Enhanced Diffusion and clustering
Mauri, Aurelio, Laurin, Luca, Montalenti, Francesco, Benvenuti, AugustoYear:
2008
Language:
english
DOI:
10.1109/sispad.2008.4648304
File:
PDF, 740 KB
english, 2008