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Thermal annealing of colloidal monolayer at the air/water interface: a facile approach to transferrable colloidal masks with tunable interstice size for nanosphere lithography
Geng, Chong, Zheng, Lu, Yu, Jie, Yan, Qingfeng, Wei, Tongbo, Wang, Xiaoqing, Shen, DezhongVolume:
22
Year:
2012
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/c2jm33660j
File:
PDF, 839 KB
english, 2012