Reverse-order source/drain formation with double offset...

IEEE Transactions on Nanotechnology 2003 / 12 Vol. 2; Iss. 4

Reverse-order source/drain formation with double offset spacer (RODOS) for low-power and high-speed application

Woo Young Choi,, Byung-Yong Choi,, Dong-Soo Woo,, Jong Duk Lee,, Byung-Gook Park,
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Volume:
2
Language:
english
Journal:
IEEE Transactions On Nanotechnology
DOI:
10.1109/tnano.2003.820805
Date:
December, 2003
File:
PDF, 558 KB
english, 2003
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