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[IEEE 2005 IEEE International Integrated Reliability Workshop - S. Lake Tahoe, CA, USA (17-20 Oct. 2005)] 2005 IEEE International Integrated Reliability Workshop - Matching Variation after HCI Stress in Advanced CMOS Technology for Analog Applications
Lin, J.C., Chen, S.Y., Chen, H.W., Lin, H.C., Jhou, Z.W., Chou, S., Ko, J., Lei, T.F., Haung, H.S.Year:
2005
Language:
english
DOI:
10.1109/irws.2005.1609575
File:
PDF, 589 KB
english, 2005