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[IEEE IEEE/SEMI. 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (23-25 Sept. 1998)] IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168) - Overview of plasma induced damage after dry etch processing
Karzhavin, Y., Wu, W.Year:
1998
Language:
english
DOI:
10.1109/asmc.1998.731581
File:
PDF, 1.03 MB
english, 1998