Thin-film-transistor process-characterization test structures
Colgan, E. G., Polastre, R. J., Takeichi, M., Wisnieff, R. L.Volume:
42
Language:
english
Journal:
IBM Journal of Research and Development
DOI:
10.1147/rd.423.0481
Date:
May, 1998
File:
PDF, 887 KB
english, 1998