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[IEEE 2006 IEEE International Conference on IC Design and Technology - Padova, Italy ()] 2006 IEEE International Conference on IC Design and Technology - Characterization of HfSiON Gate Dielectric with TiN Gate on Multi-Gate MOSFET

Weize Xiong,, Chadwin Young,, Matthew, K., Cleavelin, C.R., Schulz, T., Schruefer, K., Patruno, P.
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Year:
2006
Language:
english
DOI:
10.1109/icicdt.2006.220810
File:
PDF, 2.83 MB
english, 2006
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