[IEEE 1994 VLSI Technology Symposium - Honolulu, HI, USA...

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[IEEE 1994 VLSI Technology Symposium - Honolulu, HI, USA (7-9 June 1994)] Proceedings of 1994 VLSI Technology Symposium - Novel electrolysis-ionized-water cleaning technique for the chemical-mechanical polishing (CMP) process

Aoki, H., Nakajima, T., Kikuta, K., Hayashi, Y.
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Year:
1994
Language:
english
DOI:
10.1109/vlsit.1994.324368
File:
PDF, 189 KB
english, 1994
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