[IEEE 1994 VLSI Technology Symposium - Honolulu, HI, USA (7-9 June 1994)] Proceedings of 1994 VLSI Technology Symposium - Novel electrolysis-ionized-water cleaning technique for the chemical-mechanical polishing (CMP) process
Aoki, H., Nakajima, T., Kikuta, K., Hayashi, Y.Year:
1994
Language:
english
DOI:
10.1109/vlsit.1994.324368
File:
PDF, 189 KB
english, 1994