[IEEE International Conference on Advanced Thermal Processing of Semiconductors - Charleston, NC, USA (23-26 Sept. 2003)] 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003 - Advantages of in-situ RTP for the fabrication of metal/high-dielectric constant gate dielectric stack for sub 90 nm CMOS technology
Damjanovic, D., Poole, K.F., Singh, R.Year:
2003
Language:
english
DOI:
10.1109/rtp.2003.1249123
File:
PDF, 445 KB
english, 2003