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[IEEE 2009 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - San Diego, CA, USA (2009.09.9-2009.09.11)] 2009 International Conference on Simulation of Semiconductor Processes and Devices - The Effect of Copper Grain Size Statistics on the Electromigration Lifetime Distribution

de Orio, Roberto Lacerda, Ceric, Hajdin, Cervenka, Johann, Selberherr, Siegfried
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Year:
2009
Language:
english
DOI:
10.1109/sispad.2009.5290219
File:
PDF, 551 KB
english, 2009
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