[IEEE 2008 International Workshop on Junction Technology (IWJT) - Shanghai, China (2008.05.15-2008.05.16)] Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - Advanced junction engineering featuring millisecond annealing with co-implantation for 45 nm node high performance and low standby power CMOS technologies
Yamamoto, T., Kubo, T., Sukegawa, T., Takii, E., Fukuda, M., Sugisaki, T., Kurata, H., Satoh, S., Kase, M., Sugii, T.Year:
2008
Language:
english
DOI:
10.1109/iwjt.2008.4540022
File:
PDF, 554 KB
english, 2008