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Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers
Lawrie, Kirsten J., Blakey, Idriss, Blinco, James P., Cheng, Han Hao, Gronheid, Roel, Jack, Kevin S., Pollentier, Ivan, Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K.Volume:
21
Year:
2011
Language:
english
Journal:
Journal of Materials Chemistry
DOI:
10.1039/c0jm03288c
File:
PDF, 326 KB
english, 2011