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[IEEE 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2007.04.23-2007.04.25)] 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Multi-Gate MOSFETs with Dual Contact Etch Stop Liner Stressors on Tensile Metal Gate and Strained Silicon on Insulator (sSOI)
Hsu, Che-Hua, Xiong, Weize, Lin, Chien-Ting, Huang, Yao-Tsung, Ma, Mike, Cleavelin, C.R, Patruno, Paul, Kennard, Mark, Cayrefourcq, Ian, Shin, Kyoungsub, Liu, Tsu-Jae KingYear:
2007
Language:
english
DOI:
10.1109/vtsa.2007.378971
File:
PDF, 910 KB
english, 2007